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Helvetica Chimica Acta 誌に論文が掲載されました

Bode先生(ITbM)との共同研究成果がHelvetica Chimica Acta 誌に論文が掲載されました。

Post-assembly Photomasking of Potassium Acyltrifluoroborates (KAT) for Two-Photon 3D Patterning of PEG-Hydrogels

Haewon Song, Dino Wu, Dimitry Mazunin, Sizhou M. Liu, Yoshikatsu Sato, Nicolas Broguiere, Marcy Zenobi‐Wong, Jeffrey W. Bode*

Helvetia Chimica Acta (2020)






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