Bode先生（ITbM）との共同研究成果がHelvetica Chimica Acta 誌に論文が掲載されました。
Post-assembly Photomasking of Potassium Acyltrifluoroborates (KAT) for Two-Photon 3D Patterning of PEG-Hydrogels
Haewon Song, Dino Wu, Dimitry Mazunin, Sizhou M. Liu, Yoshikatsu Sato, Nicolas Broguiere, Marcy Zenobi‐Wong, Jeffrey W. Bode*
Helvetia Chimica Acta (2020)
DOI: https://doi.org/10.1002/hlca.202000172
